The Department has several labs with advanced equipment that includes:

• Photolithography facility (clean room)
• Sputtering equipment
• Reactive Ion Etchning (RIE) system
• Characterization of microwave devices up to 20 GHz
• High speed magnetic levitation system
• Atomic force microscopy
• Wire bonding machine
• KERR microscopy
• Computing facility providing more than 80MFlop and 50TByte
• Etc.